NIFT and FIT, New York to launch dual degree programme

The National Institute of Fashion Technology (NIFT) and the Fashion Institute of Technology (FIT), New York have finalised a dual degree programme at the undergraduate level between them.

An official press release said that this meant that selected meritorious students from NIFT would avail the opportunity to obtain a joint degree awarded both by NIFT and FIT.

The association of the two premier fashion institutes would reap benefits which would be multifold in nature and the agreement would be implemented at the earliest for the benefit of NIFT students, an official press release said.